ECI Scientists Present at SPCC 2016

ECI scientists Chuannan Bai, Eugene Shalyt, Guang Liang, Jingjing Wang, Michael McEwan, and Helen Liu co-authored a presentation entitled "Metrology for Post Etch Residue Removal", which was given at the 2016 Surface Preparation and Cleaning Conference, held on April 19-20 in Santa Clara, California.

As always, ECI's world-leading R&D department is proud to contribute to the progress of modern technology by publishing their Chemical Metrology research to the Semiconductor community.

Please click here to view the presentation.